journal6 ›› 2008, Vol. 29 ›› Issue (2): 77-78.
• Physics and electronics • Previous Articles Next Articles
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Abstract: According to the problem of temperature control of semiconductor diffuse kiln,an new control approach is described in the paper,such as BF NN.The RBF NN construct is 3-9-3.Simulation results show that control method has high quality and high effect.
Key words: semiconductor diffuse kiln, BF NN, network model
CAI Bing, HU Rong-Yu, LIU Chuan-Qing. Semiconductor Diffuse Kiln Temperature Control Modeling Based on BF NN[J]. journal6, 2008, 29(2): 77-78.
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https://zkxb.jsu.edu.cn/EN/Y2008/V29/I2/77
