journal6 ›› 2015, Vol. 36 ›› Issue (3): 32-34.DOI: 10.3969/j.cnki.jdxb.2015.03.008

• 物理与电子 • 上一篇    下一篇

掺杂氮化铝中局域磁矩的第一性原理计算

杨红,全秀娥   

  1. (吉首大学物理与机电工程学院,湖南 吉首 416000)
  • 出版日期:2015-05-25 发布日期:2015-06-03
  • 作者简介:杨红(1980—),男,湖南浏阳人,吉首大学物理与机电工程学院讲师,博士,主要从事计算物理研究.
  • 基金资助:

    湖南省教育厅科学研究项目(14C0939);吉首大学引进博士人才资助项目(jsdxrcyjkyxm201309);吉首大学教改课题资助项目(2014SYJG015)

A First Principle Study of Local Magnetic Moment on Non-Magnetic Elements Doped AlN

 YANG  Hong, QUAN  Xiu-E   

  1. (College of Physics and Mechanical & Electrical Engineering,Jishou University,Jishou 416000,Hunan China)
  • Online:2015-05-25 Published:2015-06-03

摘要:理想的稀磁半导体具有良好的室温铁磁性,氮化铝(AlN)稀磁半导体虽然具有宽的带隙和透光性,但由实验重复性差等原因,一直未得到广泛的应用.采用基于密度泛函理论的第一性原理方法计算掺杂硼(B)的AlN中局域磁矩的变化规律.通过分析电子结构发现,掺杂B后的AlN稀磁半导体中出现了明显的局域磁矩,其大小为2 μB.

关键词: 稀磁半导体, 氮化铝(AlN), 第一性原理

Abstract: The ideal diluted magnetic semiconductors has favorable room-temperature ferromagnetism.Although AlN diluted magnetic semiconductor has wide band gap and good light-admitting quality,it has not been widely applied due to the unsatisfactory replicability of the experiment.Based on first principle of the density functional theory,we calculate the electric structure of AlN semiconductors doped by B element.The analysis of the calculated electric structure displays that an evident local magnetic moment change arises on doped AlN semiconductors.The magnitude of the local magnetic moment is 2 μB.

Key words: diluted magnetic semiconductors, AlN, first principle

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