吉首大学学报(自然科学版) ›› 2023, Vol. 44 ›› Issue (6): 75-79.DOI: 10.13438/j.cnki.jdzk.2023.06.012

• 拓扑量子技术 • 上一篇    下一篇

金属掺杂对碲化镉纳米器件整流特性的影响

杨金彪,廖文虎,鲍海瑞   

  1. (1.吉首大学通信与电子工程学院,湖南 吉首 416000;2.吉首大学物理与机电工程学院,湖南 吉首 416000)
  • 出版日期:2023-11-25 发布日期:2023-12-19
  • 通讯作者: 廖文虎(1978—),男,湖北宜昌人,吉首大学物理与机电工程学院教授,主要从事介观量子输运及半导体光电器件原理与设计研究.
  • 作者简介:杨金彪(1997—),男,湖南永顺人,吉首大学通信与电子工程学院硕士研究生,主要从事半导体光电器件原理与设计研究
  • 基金资助:
    国家自然科学基金资助项目(11664010);湖南省自然科学基金面上项目(2021JJ30549);湖南省教育厅重点项目(18A293);吉首大学研究生科研项目(JGY202118)

Effect of Metal Doping on the Rectification Characteristics of CdTe Nanodevices

YANG Jinbiao,LIAO Wenhu,BAO Hairui   

  1. (1.School of Communication and Electronic Engineering,Jishou University,Jishou 416000,Hunan China;2.College of Physics and Electromechanical Engineering,Jishou University,Jishou 416000,Hunan China)
  • Online:2023-11-25 Published:2023-12-19

摘要:结合密度泛函理论与非平衡格林函数,系统研究了过渡金属(铜-铬、铜-钒和铜-钛)共掺杂碲化镉纳米电子器件的伏安特性.结果表明,3种不同共掺杂碲化镉纳米器件的伏安特性曲线均为二极管伏安特性曲线,并且在[+0.4 V,+0.8 V]偏压范围内均产生了强整流效应,最高整流比分别为5.4×104,3.8×105,2.1×106,投影态密度进一步印证了器件在+1.0 V偏压条件下的高整流比.在铜-铬共掺杂条件下,随着中心区域沟道长度的增加,器件的电流在+0.9 V偏压时有一定程度的降低,但是在[+0.5 V,+0.7 V]偏压范围内,整体整流性能得到了显著提升.

关键词: 碲化镉, 过渡金属掺杂, 伏安特性, 整流

Abstract: Based on density functional theory combined with non-equilibrium Green's function,the voltammetric properties of transition metal Cu-Cr,Cu-V and Cu-Ti co-doped CdTe nanoelectronic devices were systematically investigated.The results show that the voltammetric curves of the three different co-doped CdTe nanodevices exhibit diode voltammetric curves and produce strong rectification effects in the bias voltage range of [+0.4 V,+0.8 V].The highest rectification ratios are 5.4×104,3.8×105,and 2.1×106,respectively.The projected density of states further confirms the high rectification ratio of the device at +1.0 V bias.Under the Cu-Cr co-doping condition,the device current decreases somewhat at +0.9 V bias with increasing channel length in the center region,but the overall rectification performance is significantly improved in the [+0.5 V,+0.7 V] bias range.

Key words: CdTe, transition metal doping, voltammetric properties, rectification

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